Memosens CPS76E

Brand: Endress+Hauser

Memosens CPS76E

Brand: Endress+Hauser

Rust Automation & Controls, Endress+Hauser's exclusive USA representative in:
 CA CO HI MT   Parts of ID ND NV   UT WY

Extended Extended

Specs at a Glance

Process temperature:
Application B and H:
0 to 140 ° C (32 to 284 ° F)
Version TB:
0 to 140 ° C (32 to 284 ° F)
Version TU, TP (pressurized reference):
0 to 140 ° C (32 to 284 ° F) (140 ° C (284 ° F) for sterilization only)
maximum 100 ° C (212 ° F) in continuous operation due to increasing
pressure drop at T> 100 ° C (212 ° F)
Measuring range:
ORP: –1 500 to 1 500 mV
Application B
• pH: 0 to 14
Application H
• pH: 0 to 12
Process pressure:
Application B: 0.8 to 14 bar (11.6 to 203 psi) absolute
Application H: 0.8 to 7 bar (11.6 to 101,5 psi) absolute

Field of application

Memosens CPS76E is the heavy-duty specialist for simultaneous pH and ORP measurement. Its unique, contamination-resistant reference guarantees stable measurement in polluted, poisoning media and in media with low conductivity. Thanks to Memosens 2.0 digital technology, CPS76E combines maximum process integrity with simple operation. It resists moisture, enables lab calibration and offers extended storage of calibration and process data providing the perfect basis for predictive maintenance.

Processes in chemical industry and monitoring of processes with:

  • Quickly changing pH or ORP values
  • High proportion of electrode poisons such as H2S
  • With ATEX, IECEx, CSA C/US, NEPSI, Japan, INMETRO approvals for use in hazardous areas, zones 0, 1 and 2.

Features

  • Memosens 2.0 offers extended storage of calibration and process data, enabling better trend identification and providing a future-proof basis for predictive maintenance and enhanced IIoT services.
  • Simultaneous measurement of pH, ORP and rH values (in rH mode) provides a better process overview and allows for a tighter process control.
  • Its optional pressurized reference ensures reliable measurement in blocking media, such as dispersions.
  • Unique ion trap prevents poisoning of the electrode's junction and reference ensuring a long sensor lifetime.
  • Flexible installation thanks to optional upside-down mounting.
  • Maximum process safety through non-contact, inductive signal transmission.
  • Reduced operating costs thanks to minimized process downtime and extended sensor lifetime.

Specifications

Industry

  • Chemical

Product Family

  • Memosens

ORP / Redox

Application

  • Process technology and monitoring of processes with:
  • - Rapidly changing pH values
  • - High levels of electrode poisons, such as H2S

Characteristic

  • Digital pH/ORP electrode for chemical process with an ion trap for poison-resistant reference

Measuring range

  • ORP: –1 500 to 1 500 mV
  • Application B
  • • pH: 0 to 14
  • Application H
  • • pH: 0 to 12

Measuring principle

  • Gel compact electrode with ceramic junction and ion trap for simultaneous measurement of pH, ORP and rH value (in rH mode)

Design

  • All shaft lengths with temperature sensor
  • Advanced gel technology

Material

  • Sensor shaft: Glass to suit process
  • pH membrane glass: Type B, Type N
  • Metal lead: Ag/AgCl
  • Open aperture: Ceramic junction,
  • zirconium dioxide
  • ORP measuring element: Platinum
  • O-ring: FKM
  • Process coupling: PPS fiber-glass reinforced
  • Nameplate: Ceramic metal oxide

Dimension

  • Diameter: 12 mm (0.46 inch)
  • Shaft lengths: 120, 225, 360 and 425 mm
  • (4.68, 8.77, 14.04 and 16,57 inch)

Process temperature

  • Application B and H:
  • 0 to 140 ° C (32 to 284 ° F)
  • Version TB:
  • Version TU, TP (pressurized reference):
  • 0 to 140 ° C (32 to 284 ° F) (140 ° C (284 ° F) for sterilization only)
  • maximum 100 ° C (212 ° F) in continuous operation due to increasing
  • pressure drop at T> 100 ° C (212 ° F)

Process pressure

  • Application B: 0.8 to 14 bar (11.6 to 203 psi) absolute
  • Application H: 0.8 to 7 bar (11.6 to 101,5 psi) absolute

Temperature sensor

  • NTC 30k

Ex certification

  • With ATEX, IECEx, CSA C/US, NEPSI, Japan Ex and INMETRO approvals for use in
  • hazardous areas Zone 0, Zone 1 and Zone 2

Connection

  • Inductive, digital connection head with Memosens 2.0 technology

Ingress protection

  • IP68

pH

Application

  • Process technology and monitoring of processes with:
  • - Rapidly changing pH values
  • - High levels of electrode poisons, such as H2S

Characteristic

  • Digital pH/ORP electrode for chemical process with an ion trap for poison-resistant reference

Measuring range

  • ORP: –1 500 to 1 500 mV
  • Application B
  • • pH: 0 to 14
  • Application H
  • • pH: 0 to 12

Measuring principle

  • Gel compact electrode with ceramic junction and ion trap for simultaneous measurement of pH, ORP and rH value (in rH mode)

Design

  • All shaft lengths with temperature sensor
  • Advanced gel technology

Material

  • Sensor shaft: Glass to suit process
  • pH membrane glass: Type B, Type N
  • Metal lead: Ag/AgCl
  • Open aperture: Ceramic junction,
  • zirconium dioxide
  • ORP measuring element: Platinum
  • O-ring: FKM
  • Process coupling: PPS fiber-glass reinforced
  • Nameplate: Ceramic metal oxide

Dimension

  • Diameter: 12 mm (0.46 inch)
  • Shaft lengths: 120, 225, 360 and 425 mm
  • (4.68, 8.77, 14.04 and 16,57 inch)

Process temperature

  • Application B and H:
  • 0 to 140 ° C (32 to 284 ° F)
  • Version TB:
  • Version TU, TP (pressurized reference):
  • 0 to 140 ° C (32 to 284 ° F) (140 ° C (284 ° F) for sterilization only)
  • maximum 100 ° C (212 ° F) in continuous operation due to increasing
  • pressure drop at T> 100 ° C (212 ° F)

Process pressure

  • Application B: 0.8 to 14 bar (11.6 to 203 psi) absolute
  • Application H: 0.8 to 7 bar (11.6 to 101,5 psi) absolute

Temperature sensor

  • NTC 30k

Ex certification

  • With ATEX, IECEx, CSA C/US, NEPSI, Japan Ex and INMETRO approvals for use in
  • hazardous areas Zone 0, Zone 1 and Zone 2

Connection

  • Inductive, digital connection head with Memosens 2.0 technology

Ingress protection

  • IP68

Process Technology and Monitoring of Processes with:
  • Rapidly Changing pH Values
  • High Level of Electrode Poisons Such As H2S
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